NU Fabrication (NUFAB) has cleanroom facilities in Cook Hall and the Tech Institute. The Cook facility contain class 100 and 1000 cleanrooms and provides microfabrication and thin film processing capabilities. It is devoted to materials processing, growth, device fabrication, characterization and electronic & photonic materials. The facility provides microfabrication tools for general use by the Northwestern community, government and industrial researchers. Various techniques are available for the growth, preparation and processing of a wide range of thin film materials including in-process characterization. Training of equipment and assisted use within the facility is available to provide the necessary expertise.
This provides a centralized resource for the deposition of metal, semiconductor & dielectric thin films, photolithography, and processing. Standardmicrofabricationprocesses have been established. Available techniques include plasma enhanced chemical vapor deposition, e-beam evaporation, atomic layer deposition, reactive ion etching, photolithography, bonding, rapid thermal processing, Hall Effect Measurement and some characterization instrumentation.
For more information about this facility, click here.