The Pulsed Laser Deposition (PLD) facility provides a means of growing thin film of metals and oxides ranging from a nanometer to a micron thick. The facility contains a state of the art PVD PLD/MBE 2300 with high pressure RHEED capabilities. Samples as large as 2” diameter, deposition temperatures as high as 850°C, and deposition pressures between 2x10-7 and 1 Torr with post deposition annealing as high as 300 Torr can be accommodated. The instrument holds multiple targets which allows the deposition of multilayers and superlattices. PLD also provides a convenient way to make thin films of materials heretofore studied in the bulk by pressing and sintering a target from the bulk material; facilities are available at Northwestern for the pressing and sintering of targets.